恒电流库仑法测定基准试剂三氧化二砷的含量

用恒电流库仑法测定基准试剂三氧化二砷的含量，以恒电流通过含有碘化钾，基准试剂三氧化二砷试样的弱碱性水溶液，利用工作电极铂阳极上电生滴定剂I2与亚砷酸盐定量反应，以死停终点法确定滴定终点，测量出电解电流和电解时间，根据法拉第电解定律并利用EXCEL计算出基准试剂三氧化二砷的含量。方法的回收率为100％。     

色谱技术在中药指纹图谱研究中的应用

 介绍了气相色谱、高效液相色谱、超临界流体色谱和高速逆流色谱等几种色谱技术在中药指纹图谱研究中的应用现状,以及使用模糊聚类分析和人工神经网络分析指纹图谱对中药进行模式识别和质量鉴定的方法。     

Identification of Different Cobalt Nucleation on Glassy Carbon

The nucleation mechanisms of cobalt from sulfate solutions were studied by utilizing the electrochemical technique, chronoamperometry. It was found that the recorded current-time transients introduced from 1.0mol/L CoSO4 solution were complexes with unusual shapes. All characteristic features were identified as separate process. The instantaneous or progressive nucleation with 2D or 3D growth exists during the cobalt deposition, depending on the applied potentials.     

Thermally stimulated depolarization currents of tactic polymethyl methacrylates and their mixtures

Summary Thermally stimulated depolarization currents (TSDC) of atactic (a), syndiotactic (s) and isotactic (i) PMMA and mixtures ofs- andi-PMMA were measured. In pure tactic PMMA, TSDC peak was obtained at a temperature corresponding to the glass transition temperature of each PMMA. TSDC of mixtures isolated as precipitates from 1/1 and 1/2 (i/sweight ratio) mixed solutions showed a peak which can be attributed to the glass transition temperature of the stereocomplex. TSDC of original l/1 mixture showed two peaks which are ascribed to the glass transition temperature of residual i-PMMA and the stereocomplex. The results suggests that stereocomplex formation occurs ini/s weight ratio of 1/2 independent of the way of preparation.With 9 figures and 1 table     

旋转铂盘电极上Cu(phen)_2~(2 )与6-巯基嘌呤的相互作用

在Tris-NaC1*(pH=7.2)缓冲溶液中,应用循环伏安法,微分脉冲伏安法、旋转圆盘电极实验、交流阻抗法及其数据模拟等技术研究了Cu(phen)2 25(phcn=1.10-邻菲咯啉)与6-巯基嘌呤(6-MP)的相互作用.结果显示.Cu(phen)2 2MP与6-MP无论在扩散控制过程或电化学控制过程都发生了相互作用.Cu(phen)2 2及其与6-MP的作用产物于铂电极上均呈现一对氧化还原峰,但后者呈现的氧化还原峰负移.峰电流减小.交流阻抗结果显示,无论6-MP存在与否,Cu(phen)2 2在交流阻抗谱上均呈现两个清晰的电容弧,但当6-MP存在时,电化学反应电阻和电化学吸脱附电阻均增大.Cu(phen)2 2在不同转速下的阻抗拟合结果显示.随转速增大.电化学反应电阻和电化学吸脱附电阻均减小.双电层电容呈增大趋势,而吸脱附电容呈减小趋势:当6-MP存在时.仍然呈现此变化规律.     

An example of applications of the elementary catastrophe theory in Hamiltonian systems

The convection in atmosphere discussed in ref. [1] is rigorously treated by considering the variation of environmental temperature with the height. This represents an example of applications of the elementary catastrophe theory in Hamiltonian systems.     

Electrical and photoelectrical studies of plasma polymerized acrylonitrile

The electrical and photoelectrical properties of plasma polymerized acrylonitrile (PAN) are reported. The polymer films were studied in silver-PAN-silver systems. Electrical conductivity at room temperature was of the order of 10⁻¹¹ ohm⁻¹ cm⁻¹. The space charge limited current (SCLC) studies at room temperature and thermally stimulated current studies (TSC) over a temperature range of 290–500°K led to a clear understanding of carrier concentration, carrier mobility, trapping levels and activation energies. Photoelectric measurements were used to draw a band picture in plasma depositedPAN.     

结晶PET驻极体的分子运动与陷阱性质

半晶性的聚对苯二甲酸乙二醇酯(PET)存在不同尺寸运动单元的多重形式的分子运动,而且PET等高聚物前结构欠序、晶界和杂质等缺陷还使电子价带与导带间的禁带中出现局域能级(陷阱),并成为捕获载流子的中心,从而影响载流子的输运性质。分子运动和陷阱     

Role of Hydrodynamic Conditions in the Distribution of Anodic Dissolution Rates in Cavity Etching Regions during Electrochemical Micromachining of Partially Insulated Surfaces

Experimental study of the distribution of local rates of electrochemical micromachining in the presence of photoresist masks in various hydrodynamic conditions (macroscopically nonuniform rotating disk electrode, sprayer flow, an electrode placed into a cell with chaotic bulk electrolyte mixing) shows that the maximum etching localization is achieved at the control of the dissolution rate by the mass transport rate (at achieving the anodic limiting current). The localization enhancement as compared to the primary current distribution takes place in the case of a turbulent flow at hydrodynamic conditions where the removal of dissolution products from the undercutting region is hindered. These conditions (electrochemical reaction limited by the ion mass transport rate, high resistance to the mass transport in the undercutting region) are necessary for the localization enhancement using a pulsed anodic–cathodic treatment.